Boron Carbide (B4C) Sputtering Targets
Composition: Boron Carbide (B4C)
Catalog No.DPCB5ST
Purity:99.5%
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Click here for the specifications of B4C sputter target
Click here for the SDS document of B4C Sputter Target
- Product Details
Boron Carbide (B4C) sputtering target specifications
Formula: B4C
CAS No.: 12069-32-8
Max. dia. of flat disc sputter target: 8"
Typical lead time of B4C sputtering target: 4 weeks
Regular Dimensions and Price of Boron Carbide (B4C) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Boron Carbide sputtering target |
$595 | Add to Chart |
3"dia
x 1/8"t Boron Carbide sputtering target |
$652 |
Add to Chart |
2"dia
x 1/8"t B4C sputtering target with In bonding to Cu bck plt |
$675 |
Add to Chart |
3"dia
x 1/8"t B4C sputtering target with In bonding to Cu bck plt |
$787 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc excels as a specialized supplier of custom-manufactured research and development consumables, catering to the specific needs of a diverse clientele. Our flexible equipment setup is adept at producing flat disc sputter targets, meeting the varied demands of customers from multiple sectors. We are a trusted partner to US national labs, international universities, and research institutions, supporting their innovative work with our tailored target materials and customized products. Our commitment to quality and adaptability ensures that researchers and scientists receive the highest standard of materials for their groundbreaking projects. Please check here for the list of our other carbides sputter targets
Sputtering Boron Carbide
Sputtering is a key process for making thin films used in electronics and industry. B4C sputtering targets are important because they are hard and low density. This means they make durable coatings without adding much weight. In sputtering, ions sped up by an electric field hit the B4C target. This knocks atoms off the target material. Then, the atoms land evenly on a surface to form a thin film. With this process, the film's thickness and mix can be precisely controlled. So B4C is invaluable for producing thin films with specific electrical conductivity. The versatility of B4C in sputtering shows why it is vital for manufacturing many electronics. These need consistent quality and material integrity. In summary, B4C enables tailored thin films through controlled sputtering. Its hardness and low density make it ideal for electronics needing durable, lightweight coatings.
Boron Carbide Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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