Cerium Fluoride (CeF3) Sputtering Targets
Composition: Cerium Fluoride (CeF3)
Catalog No.DPHL58ST
Purity:99.9% ~ 99.99%(REM)Please click for discount and other size
- Product Details
Cerium Fluoride (CeF3) sputtering target specifications
Formula: CeF3
CAS No.: 7758-88-5
Max. dia. of flat disc sputter target: 14" dia
Typical lead time of CeF3 sputtering target: 4 weeks
Regular Dimensions and Price of Cerium Fluoride (CeF3) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Cerium Fluoride sputtering target |
$753 | Add to Chart |
3"dia
x 1/8"t Cerium Fluoride sputtering target |
$826 |
Add to Chart |
2"dia
x 1/8"t CeF3 sputtering target with In bonding to Cu bck plt |
$833 |
Add to Chart |
3"dia
x 1/8"t CeF3 sputtering target with In bonding to Cu bck plt |
$961 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Fluorides sputter targets
Sputtering Cerium Fluoride
Sputtering technique are frequently used to create a thin film of Cerium Fluoride . The CeF3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Cerium Fluoride in this case, to create a thin film of CeF3 on the surface of the substrate.
Cerium Fluoride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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