Deposition Materials
Physcial vapor deposition (PVD) technology is a widely used method for depositing thin layers of materials onto various substrates. It involves the application of deposition materials onto a target surface using techniques such as sputtering and evaporation. These techniques utilize specialized materials known as sputtering targets and evaporation materials.
Sputtering targets are solid materials that are bombarded with high-energy ions to dislodge atoms or molecules from their surface. These dislodged particles then deposit onto the substrate, forming a thin film. Sputtering targets are available in various compositions to meet specific deposition requirements.
QS Advanced Materials is a professional supplier of sputtering targets and evaporation materials made from rare and customized materials, especially rare earth, ceramics, composite oxides, special alloys and high purity materials.
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Zirconium (Zr) Sputtering Targets
Composition: Zirconium
Catalog No.DPME40ST
Purity:99.9%Please click for discount and other size
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Selenium (Se) Sputtering Targets
Composition: Selenium
Catalog No.DPMA34ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si) (N-type) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si) (undoped) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si)(P-type) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Tantalum (Ta) Sputtering Targets
Composition: Tantalum
Catalog No.DPMA73ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Tungsten (W) Sputtering Targets
Composition: Tungsten
Catalog No.DPMA74ST
Purity:99.95%Please click for discount and other size
Click here for the specifications of Tungsten sputter target
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Nickel Iron (Ni/Fe) Sputtering Targets
Composition: Nickel and Iron
Catalog No.DPMA26ST
Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of Ni/Fe 80/20 sputter target
Click here for the SDS document of Ni/Fe 80/20 Sputter Target
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Rhenium (Re) Sputtering Targets
Composition: Rhenium
Catalog No.:DPMA75ST
Purity:99.99%
Maximum Diameter:8"
Typical Lead Time:2 weeks
Click here for the SDS document of Rhenium disc sputter target -
Aluminium Nitride (AlN) Disc Sputtering Targets
Composition: Aluminium Nitride (AlN)
Catalog No.:DPND13ST
Purity:99.9%
Please click for discount and other size -
Boron Nitride (BN) Sputtering Targets
Composition: Boron Nitride (BN)
Catalog No.DPND5ST
Purity:99.5%Please click for discount and other size
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Silicon Nitride (Si3N4) Sputtering Targets
Composition: Silicon Nitride (Si3N4)
Catalog No.DPND14ST
Purity:99.5% ~ 99.9%Please click for discount and other size
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Titanium Nitride (TiN) Sputtering Targets
Composition:Titanium Nitride (TiN)
Catalog No.:DPND22ST
Purity:99.50%
Please click for discount and other size -
Vanadium Nitride (VN) Sputtering Targets
Composition: Vanadium Nitride (VN)
Catalog No.DPND23ST
Purity:99.5%Please click for discount and other size
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Zirconium Nitride (ZrN) Sputtering Targets
Composition: Zirconium Nitride
Catalog No.DPND40ST
Purity:99.5%Please click for discount and other size
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Vanadium Dioxide (VO2) Sputtering Target
Composition:Vanadium(IV) Dioxide (VO2)
Catalog No.:DPOX23ST2
Purity:99.99%
Maximum Diameter:10"
Typical Lead Time:4 weeks
Ref. Price:$565 (2" Dia. x 1/8") -
Chromium Boride (CrB2) Sputtering Targets
Composition: Chromium Boride (CrB2)
Catalog No.DPBO24ST
Purity:99.9%
Please click for discount and other sizeClick here for the specifications of CrB2 sputter target
Click here for the SDS document of CrB2 Sputter Target
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Cobalt Boride (CoB) Sputtering Targets
Composition: Cobalt Boride (CoB)
Catalog No.DPBO27ST
Purity:99.5%
Please click for discount and other sizeClick here for the specifications of CoB sputter target
Click here for the SDS document of CoB Sputter Target
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Lanthanum Boride (LaB6) Sputtering Targets
Composition: Lanthanum Boride (LaB6)
Catalog No.DPBO57ST
Purity:99.9%
Please click for discount and other sizeClick here for the specifications of LaB6 sputter target
Click here for the SDS document of LaB6 Sputter Target
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Hafnium Boride (HfB2) Sputtering Targets
Composition: Hafnium Boride (HfB2)
Catalog No.DPBO72ST
Purity:99.5%
Please click for discount and other sizeClick here for the specifications of HfB2 sputter target
Click here for the SDS document of HfB2 Sputter Target