Deposition Materials
Physcial vapor deposition (PVD) technology is a widely used method for depositing thin layers of materials onto various substrates. It involves the application of deposition materials onto a target surface using techniques such as sputtering and evaporation. These techniques utilize specialized materials known as sputtering targets and evaporation materials.
Sputtering targets are solid materials that are bombarded with high-energy ions to dislodge atoms or molecules from their surface. These dislodged particles then deposit onto the substrate, forming a thin film. Sputtering targets are available in various compositions to meet specific deposition requirements.
QS Advanced Materials is a professional supplier of sputtering targets and evaporation materials made from rare and customized materials, especially rare earth, ceramics, composite oxides, special alloys and high purity materials.
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Aluminum Copper Silicon (AlSiCu) Sputtering Target
Composition: AlSiCu
Catalog No.DPSI1329ST
Purity:99.9%
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Nickel Nitride (NiN) Sputtering Target
Composition:NiN
Catalog No.:DPSI41ST2
Purity:99.90%
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Strontium Ruthanate (SrRuO3) Sputtering Targets
Composition: Strontium Ruthanate (SrRuO3)
Catalog No.:DPOX38ST
Purity:99.90%
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Calcium Ruthenate (CaRuO3) Sputter Targets
Composition:Calcium Ruthenate (CaRuO3)
Catalog No.:DPATOST
Purity:99.9% ~ 99.99%
Maximum Diameter:6"
Typical Lead Time:5 weeks
Price:$1900 (2" Dia. x 1/8") -
Lithium Iron Phosphate (LiFePO4, LFP) Sputter Targets
Composition:Lithium Iron Phosphate (LiFePO4)
Catalog No.:DPOX3IPST
Purity:99.9% ~ 99.99%
Maximum Diameter:10"
Typical Lead Time:4 weeks
Price:$674 (2" Dia. x 1/8") -
Strontium Niobate (SrNbO3) Sputtering Targets
Composition:Strontium Niobate (SrNbO3)
Catalog No.:DPOXSNTST
Purity:99.9% ~ 99.99%
Maximum Diameter:6"
Typical Lead Time:5 weeks