Main-group Metals
The main group metals include elements such as Lithium (Li), Magnesium (Mg), Aluminum (Al), Calcium (Ca), Gallium (Ga), Strontium (Sr), Indium (In), Tin (Sn), Barium (Ba), Lead (Pb), and Bismuth (Bi). Each of these elements has unique characteristics and finds applications in different fields.
Magnesium (Mg): Magnesium is known for its lightweight properties and is used in the production of lightweight alloys for aerospace, automotive, and electronic applications. Magnesium sputter targets are employed in thin film deposition for coating applications, including protective coatings and corrosion resistance.
Aluminum (Al): Aluminum is a versatile metal used in various industries. It is commonly used in the production of packaging materials, construction materials, transportation (e.g., cars, airplanes), and electronics. Aluminum sputter targets are utilized in thin film deposition for applications like optical coatings and semiconductor manufacturing.
Calcium (Ca): Calcium plays a vital role in various biological processes and is an essential nutrient for humans and animals. In the industrial sector, calcium compounds are used in the production of cement, steel, and chemicals.
Gallium (Ga): Gallium has unique properties and finds applications in electronics, optics, and solar cells. Gallium oxide or IGZO sputter targets are utilized in thin film deposition for applications like semiconductors and LEDs (light-emitting diodes).
Strontium (Sr): Strontium compounds are used in the production of pyrotechnics, ferrite magnets, and medical imaging. Strontium Titanate sputtering targets are employed in thin film deposition for applications such as displays and photovoltaics.
Indium (In): Indium is widely used in the electronics industry due to its excellent electrical conductivity and low melting point. It is utilized in applications like touchscreens, LCD displays, and solar cells. Indium Tin Oxide sputter target is crucial for the manufacturing of electronic devices in touchable screen
Tin (Sn): Tin is commonly used as a coating material to protect other metals from corrosion. It is also used in the production of soldering materials, food packaging, and various alloys.
Barium (Ba): Barium compounds are used in medical imaging, as well as in the production of glass, ceramics, and fireworks.
Lead (Pb): Lead has been widely used in various applications, such as batteries, ammunition, and construction materials. However, due to its harmful effects on health and the environment, its use has been significantly reduced in recent years.
Bismuth (Bi): Bismuth is used in various industries, including cosmetics, pharmaceuticals, and electronics. It has low toxicity and is often used as a replacement for lead in certain applications.
These main group metals have diverse applications across industries, ranging from electronics and energy storage to construction and medicine. Sputter targets based on these elements are crucial in thin film deposition processes, enabling the production of advanced coatings and electronic devices.
- Lithium (Li) Products
- Magnesium
- Aluminum
- Calcium
- Gallium
- Strontium
- Indium
- Tin (Sn) Products
- Barium
- Lead
- Bismuth
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Magnesium (Mg) Sputtering Targets
Composition: Magnesium
Catalog No.DPME12ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Tin (Sn) Sputtering Targets
Composition: Tin
Catalog No.DPME50ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Aluminium Nitride (AlN) Disc Sputtering Targets
Composition: Aluminium Nitride (AlN)
Catalog No.:DPND13ST
Purity:99.9%
Please click for discount and other size -
Magnesium (MgB2)Boride Sputtering Targets
Composition: Magnesium (MgB2)
Catalog No.DPBO12ST
Purity:99.9%
Please click for discount and other sizeClick here for the specifications of MgB2 sputter target
Click here for the SDS document of MgB2 Sputter Target
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Aluminum Fluoride (AlF3) Sputtering Targets
Composition: Aluminum Fluoride (AlF3)
Catalog No.DPHL13ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Barium Fluoride (BaF2) Sputtering Targets
Composition: Barium Fluoride (BaF2)
Catalog No.DPHL56ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Lithium Fluoride (LiF) Sputtering Targets
Composition: Lithium Fluoride (LiF)
Catalog No.DPHL3ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Lead Zirconate (PbZrO3) Sputtering Targets
Composition: Lead Zirconate (PbZrO3)
Catalog No.DPOX82ST
Purity:99.9%Please click for discount and other size
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Strontium Ruthenate (SrRuO3) Sputtering Targets
Composition: Strontium Ruthenate (SrRuO3)
Catalog No.DPOX38ST
Purity:99.9%Please click for discount and other size
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Strontium Titanate (SrTiO3) Sputtering Targets
Composition: Strontium Titanate (SrTiO3)
Catalog No.DPOX38ST
Purity:99.9%Please click for discount and other size