Pure Metal and Alloy Sputter Target
Sputtering, a physical vapor deposition (PVD) technique, has become an indispensable tool in the fabrication of a wide range of thin films and coatings. At the heart of this process are the sputtering targets, which play a crucial role in determining the properties and composition of the deposited materials.
Among the diverse range of sputtering target materials, metallic and alloy targets have emerged as versatile and widely-used options, owing to their unique characteristics and potential applications.
Pure metal sputtering targets, such as those made from aluminum (Al), copper (Cu), titanium (Ti), or chromium (Cr), are commonly used to deposit thin films for various purposes. Aluminum targets, for instance, are widely employed in the production of reflective coatings for optical applications, while copper targets are crucial for the fabrication of conductive layers in electronic devices.
Moving beyond pure metals, alloy sputtering targets offer even greater flexibility and tailored properties. Stainless steel targets, for example, can be used to deposit corrosion-resistant coatings for medical implants and industrial equipment. Nickel-chromium (Ni-Cr) alloy targets, on the other hand, are invaluable for the deposition of oxidation-resistant and high-temperature protective layers.
In the realm of magnetic materials, alloy sputtering targets composed of elements such as iron (Fe), cobalt (Co), and neodymium (Nd) are essential for the production of thin films used in data storage devices, sensors, and advanced electromagnetic components.
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Magnesium (Mg) Sputtering Targets
Composition: Magnesium
Catalog No.DPME12ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Manganese (Mn) Sputtering Targets
Composition: Manganese
Catalog No.DPME25ST
Purity:99.5% ~ 99.95%Please click for discount and other size
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Molybdenum (Mo) Sputtering Targets
Composition: Molybdenum
Catalog No.DPME42ST
Purity:99.95%Please click for discount and other size
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Nickel (Ni) Sputtering Targets
Composition: Nickel
Catalog No.DPME28ST
Purity:99.9% ~ 99.995%Please click for discount and other size
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Niobium (Nb) Sputtering Targets
Composition: Niobium
Catalog No.DPME41ST
Purity:99.95%Please click for discount and other size
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Silver (Ag) Sputtering Targets
Composition: Silver
Catalog No.DPME47ST
Purity:99.9%Please click for discount and other size
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Tellurium (Te) Sputtering Targets
Composition: Tellurium
Catalog No.DPME52ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Tin (Sn) Sputtering Targets
Composition: Tin
Catalog No.DPME50ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Titanium (Ti) Sputtering Targets
Composition: Titanium
Catalog No.DPME22ST
Purity:99.0% ~ 99.99%Please click for discount and other size
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Vanadium (V) Sputtering Targets
Composition: Vanadium
Catalog No.DPME23ST
Purity:99.9%Please click for discount and other size
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Zinc (Zn) Sputtering Targets
Composition: Zinc
Catalog No.DPMA30ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Zirconium (Zr) Sputtering Targets
Composition: Zirconium
Catalog No.DPME40ST
Purity:99.9%Please click for discount and other size
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Selenium (Se) Sputtering Targets
Composition: Selenium
Catalog No.DPMA34ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si) (N-type) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si) (undoped) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Silicon (Si)(P-type) Sputtering Targets
Composition: Silicon
Catalog No.DPMA14ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Tantalum (Ta) Sputtering Targets
Composition: Tantalum
Catalog No.DPMA73ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Tungsten (W) Sputtering Targets
Composition: Tungsten
Catalog No.DPMA74ST
Purity:99.95%Please click for discount and other size
Click here for the specifications of Tungsten sputter target
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Nickel Iron (Ni/Fe) Sputtering Targets
Composition: Nickel and Iron
Catalog No.DPMA26ST
Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of Ni/Fe 80/20 sputter target
Click here for the SDS document of Ni/Fe 80/20 Sputter Target
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Rhenium (Re) Sputtering Targets
Composition: Rhenium
Catalog No.:DPMA75ST
Purity:99.99%
Maximum Diameter:8"
Typical Lead Time:2 weeks
Click here for the SDS document of Rhenium disc sputter target