Pure Metal and Alloy Sputter Target
Sputtering, a physical vapor deposition (PVD) technique, has become an indispensable tool in the fabrication of a wide range of thin films and coatings. At the heart of this process are the sputtering targets, which play a crucial role in determining the properties and composition of the deposited materials.
Among the diverse range of sputtering target materials, metallic and alloy targets have emerged as versatile and widely-used options, owing to their unique characteristics and potential applications.
Pure metal sputtering targets, such as those made from aluminum (Al), copper (Cu), titanium (Ti), or chromium (Cr), are commonly used to deposit thin films for various purposes. Aluminum targets, for instance, are widely employed in the production of reflective coatings for optical applications, while copper targets are crucial for the fabrication of conductive layers in electronic devices.
Moving beyond pure metals, alloy sputtering targets offer even greater flexibility and tailored properties. Stainless steel targets, for example, can be used to deposit corrosion-resistant coatings for medical implants and industrial equipment. Nickel-chromium (Ni-Cr) alloy targets, on the other hand, are invaluable for the deposition of oxidation-resistant and high-temperature protective layers.
In the realm of magnetic materials, alloy sputtering targets composed of elements such as iron (Fe), cobalt (Co), and neodymium (Nd) are essential for the production of thin films used in data storage devices, sensors, and advanced electromagnetic components.
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Cobalt Iron (Co/Fe) Sputtering Targets
Composition: Cobalt and Iron
Catalog No.DPMA27ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Cobalt Iron Boron (Co/Fe/B) Sputtering Targets
Composition: Cobalt, Boron and Iron
Catalog No.DPMA BO27ST
Purity:99.5% ~ 99.9%Please click for discount and other size
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Copper Gallium (Cu/Ga) Sputtering Targets
Composition: Copper and Gallium
Catalog No.DPMA29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Germanium (Cu/Ge) Sputtering Targets
Composition: Copper and Germanium
Catalog No.DPMA29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Indium (Cu/In) Sputtering Targets
Composition: Copper and Indium
Catalog No.DPMA29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Copper Indium Gallium (Cu/In/Ga) Sputtering Targets
Composition: Copper, Galliumand Indium
Catalog No.DPMA29ST
Purity:99.9% ~ 99.95%Please click for discount and other size
Click here for the specifications of Cu/In/Ga sputter target
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Molybdenum Chromium (Mo/Cr) Sputtering Targets
Composition: Molybdenum and Chromium
Catalog No.DPMA42ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Molybdenum Niobium (Mo/Nb) Sputtering Targets
Composition: Molybdenum and Niobium
Catalog No.DPMA42ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Molybdenum Titanium (Mo/Ti) Sputtering Targets
Composition: Molybdenum and Titanium
Catalog No.DPMA42ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Nickel Chromium (Ni/Cr 80/20) Sputtering Targets
Composition: Nickel and Chromium
Catalog No.DPMA28ST
Purity:99.9% ~ 99.99%
Please click for discount and other sizeClick here for the specifications of Ni/Cr 80/20 sputter target
Click here for the SDS document of Ni/Cr 80/20 Sputter Target
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Tungsten Titanium (W/Ti) Sputtering Targets
Composition: Tungsten and Titanium
Catalog No.DPMA74ST
Purity:99.9% ~ 99.95%Please click for discount and other size
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Zinc Tin (Zn/Sn) Sputtering Targets
Composition: Zinc and Tin
Catalog No.DPMA30ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Antimony (Sb) Sputtering Targets
Composition: Antimony
Catalog No.DPME51ST
Purity:99.9% ~ 99.99995%
Please click for discount and other sizeClick here for the specifications of Sb sputter target
Click here for the SDS document of Sb Sputter Target
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Bismuth (Bi) Sputtering Targets
Composition: Bismuth
Catalog No.DPME83ST
Purity:99.9% ~ 99.999%
Please click for discount and other sizeClick here for the specifications of Bi sputter target
Click here for the SDS document of Bi Sputter Target
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Boron (B) Sputtering Targets
Composition: Boron
Catalog No.DPME5ST
Purity:99.5%Please click for discount and other size
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Cadmium (Cd) Sputtering Targets
Composition: Cadmium
Catalog No.DPME48ST
Purity:99.9% ~ 99.999%Please click for discount and other size
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Chromium (Cr) Sputtering Targets
Composition: Chromium
Catalog No.DPME24ST
Purity:99.5% ~ 99.995%Please click for discount and other size
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Cobalt (Co) Sputtering Targets
Composition: Cobalt
Catalog No.DPME27ST
Purity:99.9% ~ 99.99%Please click for discount and other size
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Germanium (Ge) Sputtering Targets
Composition: Germanium
Catalog No.DPME32ST
Purity:99.9% ~ 99.9999%Please click for discount and other size
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Hafnium (Hf) Sputtering Targets
Composition: Hafnium
Catalog No.DPME72ST
Purity:99.95%Please click for discount and other size