Barium Fluoride (BaF2) Sputtering Targets
Composition: Barium Fluoride (BaF2)
Catalog No.DPHL56ST
Purity:99.9% ~ 99.99%Please click 
for discount and other size
- Product Details
Barium Fluoride (BaF2) sputtering target specifications
Formula: BaF2
CAS No.: 7787-32-8
Max. dia. of flat disc sputter target: 12"
Typical lead time of BaF2 sputtering target: 4 weeks
Regular Dimensions and Price of Barium Fluoride (BaF2) Sputtering Target
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Product Name |
Reference Price |
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|
2"dia
x 1/8"t Barium Fluoride sputtering target |
$793 | Add to Chart |
|
3"dia
x 1/8"t Barium Fluoride sputtering target |
$1300 |
Add to Chart |
|
2"dia
x 1/8"t BaF2 sputtering target with In bonding to Cu bck plt |
$873 |
Add to Chart |
|
3"dia
x 1/8"t BaF2 sputtering target with In bonding to Cu bck plt |
$1,435 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Fluorides sputter targets
Sputtering Barium Fluoride
Sputtering technique are frequently used to create a thin film of Barium Fluoride . The BaF2 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Barium Fluoride in this case, to create a thin film of BaF2 on the surface of the substrate.
Barium Fluoride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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