Cobalt Iron Boron (Co/Fe/B) Sputtering Targets
Composition: Cobalt, Boron and Iron
Catalog No.DPMA BO27ST
Purity:99.5% ~ 99.9%Please click for discount and other size
- Product Details
Cobalt Iron Boron (Co/Fe/B) sputtering target specifications
Formula: Co/Fe/B
CAS No.: N.A.
Max. dia. of flat disc sputter target: 18"
Typical lead time of Co/Fe/B sputtering target: 4 weeks
Regular Dimensions and Price of Cobalt Iron Boron (Co/Fe/B) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Cobalt Iron Boron sputtering target |
$515.5 | Add to Chart |
3"dia
x 1/8"t Cobalt Iron Boron sputtering target |
P.O.R. |
Add to Chart |
2"dia
x 1/8"t Co/Fe/B sputtering target with In bonding to Cu bck plt |
$596 |
Add to Chart |
3"dia
x 1/8"t Co/Fe/B sputtering target with In bonding to Cu bck plt |
P.O.R. | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Alloys sputter targets
Sputtering Cobalt Iron Boron
Sputtering technique are frequently used to create a thin film of Cobalt Iron Boron . The Co/Fe/B target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Cobalt Iron Boron in this case, to create a thin film of Co/Fe/B on the surface of the substrate.
Cobalt Iron Boron Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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