Aluminum Silicon (AlSi) Sputtering Target
Composition: AlSi Catalog No.DPSI13ST Purity:99.9%
- Product Details
Aluminum Silicon (AlSi) sputtering target specifications
Formula: AlSi
CAS No.: N.A.
Max. dia. of flat disc sputter target: 14"
Typical lead time of AlSi sputtering target: 4 weeks
Regular Dimensions and Price of Aluminum Silicon (AlSi) Sputtering Target
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Product Name |
Reference Price |
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2"dia
x 1/8"t Aluminum Silicon sputtering target |
580 | Add to Chart |
|
3"dia
x 1/8"t Aluminum Silicon sputtering target |
700 |
Add to Chart |
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2"dia
x 1/8"t AlSi sputtering target with In bonding to Cu bck plt |
$650 |
Add to Chart |
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3"dia
x 1/8"t AlSi sputtering target with In bonding to Cu bck plt |
$840 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Alloys sputter targets
Sputtering Aluminum Silicon
Sputtering technique are frequently used to create a thin film of Aluminum Silicon. The AlSi target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Aluminum Silicon in this case, to create a thin film of AlSi on the surface of the substrate.
Aluminum Silicon Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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