Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets
Composition: Silicon Monoxide (Cr-SiO)
Catalog No.DPOX24ST
Purity:99.9% ~ 99.99%Please click for discount and other size
- Product Details
Silicon Monoxide (Cr-SiO) sputtering target specifications
Formula: Cr-SiO
CAS No.:N.A.
Max. dia. of flat disc sputter target: 18"
Typical lead time of Cr-SiO sputtering target: 4 weeks
Regular Dimensions and Price of Silicon Monoxide (Cr-SiO) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Silicon Monoxide sputtering target |
$595 | Add to Chart |
3"dia
x 1/8"t Silicon Monoxide sputtering target |
$782 |
Add to Chart |
2"dia
x 1/8"t Cr-SiO sputtering target with In bonding to Cu bck plt |
$675 |
Add to Chart |
3"dia
x 1/8"t Cr-SiO sputtering target with In bonding to Cu bck plt |
$917 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
Sputtering Silicon Monoxide
Sputtering technique are frequently used to create a thin film of Silicon Monoxide . The Cr-SiO target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Silicon Monoxide in this case, to create a thin film of Cr-SiO on the surface of the substrate.
Silicon Monoxide Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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