Cobalt Boride (CoB) Sputtering Targets
Composition: Cobalt Boride (CoB)
Catalog No.DPBO27ST
Purity:99.5%
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Click here for the specifications of CoB sputter target
Click here for the SDS document of CoB Sputter Target
- Product Details
Cobalt Boride (CoB) sputtering target specifications
Formula: CoB
CAS No.: 12006-78-9
Max. dia. of flat disc sputter target: 8"
Typical lead time of CoB sputtering target: 4 weeks
Regular Dimensions and Price of Cobalt Boride (CoB) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Cobalt Boride sputtering target |
$595 | Add to Chart |
3"dia
x 1/8"t Cobalt Boride sputtering target |
$869 |
Add to Chart |
2"dia
x 1/8"t CoB sputtering target with In bonding to Cu bck plt |
$675 |
Add to Chart |
3"dia
x 1/8"t CoB sputtering target with In bonding to Cu bck plt |
$1,004 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Borides sputter targets
Sputtering Cobalt Boride
Sputtering technique are frequently used to create a thin film of Cobalt Boride. The CoB target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Cobalt Boride in this case, to create a thin film of CoB on the surface of the substrate.
Cobalt Boride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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