Holmium (Ho) Sputter Target
Composition: Holmium (Ho)
Catalog No.DPME67ST
Purity:99.9% ~ 99.99%REM
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Holmium (Ho) sputtering target specifications
Formula: Ho
CAS No.: 7440-60-0
Max. dia. of flat disc sputter target: 14" dia
Typical lead time of Ho sputtering target: 4 weeks
Regular Dimensions and Price of Holmium (Ho) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Holmium sputtering target |
$350 | Add to Chart |
3"dia
x 1/8"t Holmium sputtering target |
P.O.R. |
Add to Chart |
2"dia
x 1/8"t Ho sputtering target with In bonding to Cu bck plt |
$430 |
Add to Chart |
3"dia
x 1/8"t Ho sputtering target with In bonding to Cu bck plt |
P.O.R. | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Rare Earth Metals sputter targets
Sputtering Holmium
Sputtering technique are frequently used to create a thin film of Holmium. The Ho target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Holmium in this case, to create a thin film of Ho on the surface of the substrate.
Holmium Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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