Magnesium (Mg) Sputtering Targets
Composition: Magnesium
Catalog No.DPME12ST
Purity:99.9% ~ 99.99%Please click 
for discount and other size
- Product Details
Magnesium (Mg) sputtering target specifications
Formula: Mg
CAS No.: 7439-95-4
Max. dia. of flat disc sputter target: 18"
Typical lead time of Mg sputtering target: 2 weeks
Regular Dimensions and Price of Magnesium (Mg) Sputtering Target
|
Product Name |
Reference Price |
|
|
2"dia
x 1/8"t Magnesium sputtering target |
$195 | Add to Chart |
|
3"dia
x 1/8"t Magnesium sputtering target |
$320 |
Add to Chart |
|
2"dia
x 1/8"t Mg sputtering target with In bonding to Cu bck plt |
$275 |
Add to Chart |
|
3"dia
x 1/8"t Mg sputtering target with In bonding to Cu bck plt |
$455 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Single Element sputter targets
Sputtering Magnesium
Sputtering technique are frequently used to create a thin film of Magnesium . The Mg target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Magnesium in this case, to create a thin film of Mg on the surface of the substrate.
Magnesium Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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