Tantalum Carbide (TaC) Sputtering Targets
Composition: Tantalum Carbide (TaC)
Catalog No.DPCB73ST
Purity:99.5%Please click 
for discount and other size
- Product Details
Tantalum Carbide (TaC) sputtering target specifications
Formula: TaC
CAS No.: 12070-06-3
Max. dia. of flat disc sputter target: 8"
Typical lead time of TaC sputtering target: 4 weeks
Regular Dimensions and Price of Tantalum Carbide (TaC) Sputtering Target
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Product Name |
Reference Price |
|
|
2"dia
x 1/8"t Tantalum Carbide sputtering target |
$714 | Add to Chart |
|
3"dia
x 1/8"t Tantalum Carbide sputtering target |
$1120 |
Add to Chart |
|
2"dia
x 1/8"t TaC sputtering target with In bonding to Cu bck plt |
$794 |
Add to Chart |
|
3"dia
x 1/8"t TaC sputtering target with In bonding to Cu bck plt |
$1,255 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Carbides sputter targets
Sputtering Tantalum Carbide
Sputtering technique are frequently used to create a thin film of Tantalum Carbide . The TaC target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Tantalum Carbide in this case, to create a thin film of TaC on the surface of the substrate.
Tantalum Carbide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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