Titanium Carbide (TiC) Sputtering Targets
Composition: Titanium Carbide (TiC)
Catalog No.DPCB22ST
Purity:99.5%Please click 
for discount and other size
- Product Details
Titanium Carbide (TiC) sputtering target specifications
Formula: TiC
CAS No.: 125620-19-1
Max. dia. of flat disc sputter target: 8"
Typical lead time of TiC sputtering target: 4 weeks
Regular Dimensions and Price of Titanium Carbide (TiC) Sputtering Target
|
Product Name |
Reference Price |
|
|
2"dia
x 1/8"t Titanium Carbide sputtering target |
608 | Add to Chart |
|
3"dia
x 1/8"t Titanium Carbide sputtering target |
634 |
Add to Chart |
|
2"dia
x 1/8"t TiC sputtering target with In bonding to Cu bck plt |
$714 |
Add to Chart |
|
3"dia
x 1/8"t TiC sputtering target with In bonding to Cu bck plt |
$743 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Carbides sputter targets
Sputtering Titanium Carbide
Sputtering technique are frequently used to create a thin film of Titanium Carbide . The TiC target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Titanium Carbide in this case, to create a thin film of TiC on the surface of the substrate.
Titanium Carbide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
Related Product