Tungsten Carbide (WC) Sputtering Targets
Composition:
Tungsten Carbide (WC)
Catalog No.:DPCB74STPurity:0.995Please click for discount and other size
- Product Details
Tungsten Carbide (WC) sputtering target specifications
Formula: WC
CAS No.: 12070-12-1
Max. dia. of flat disc sputter target: 8"
Typical lead time of WC sputtering target: 4 weeks
Regular Dimensions and Price of Tungsten Carbide (WC) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Tungsten Carbide sputtering target |
$595 | Add to Chart |
3"dia
x 1/8"t Tungsten Carbide sputtering target |
$695 |
Add to Chart |
2"dia
x 1/8"t WC sputtering target with In bonding to Cu bck plt |
$675 |
Add to Chart |
3"dia
x 1/8"t WC sputtering target with In bonding to Cu bck plt |
$830 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product.
Sputtering Tungsten Carbide
Sputtering technique are frequently used to create a thin film of Tungsten Carbide . The WC target material is placed on the electrode in the sputtering
chamber. Heavy ion particle or laser are frequently used to ejecting coating
material from the target, made by Tungsten Carbide in this case, to create a
thin film of WC on the surface of the substrate.
Tungsten Carbide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA




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