Aluminum Telluride (Al2Te) Sputtering Targets

Aluminum Telluride (Al2Te) sputtering target specifications

Formula: Al2Te

CAS No.: 12043-29-7

Max. dia. of flat sputter target: 10"

Typical lead time of Al2Te sputtering target: 4 weeks

Regular Dimensions and Price of Aluminum Telluride (Al2Te) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Aluminum Telluride sputtering target	$990	Add to Chart
3"dia x 1/8"t Aluminum Telluride sputtering target	$1000	Add to Chart
2"dia x 1/8"t Al2Te sputtering target with In bonding to Cu bck plt	$1,070	Add to Chart
3"dia x 1/8"t Al2Te sputtering target with In bonding to Cu bck plt	$1,135	Add to Chart

About Our Sputtering Target

 QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product. 

Sputtering Aluminum Telluride

Sputtering technique are frequently used to create a thin film of Aluminum Telluride . The Al2Te target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Aluminum Telluride in this case, to create a thin film of Al2Te on the surface of the substrate.

Aluminum Telluride Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

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