Bismuth Ferrite (Garnet, Bi3Fe5O12) Sputtering Targets

Bismuth Ferrite (Bi3Fe5O12) sputtering target specifications

Formula: Bi3Fe5O12

CAS No.:N.A.

Max. dia. of flat disc sputter target: 6"

Typical lead time of Bi3Fe5O12 sputtering target: 5 weeks

Regular Dimensions and Price of Bismuth Ferrite (Bi3Fe5O12) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Bismuth Ferrite sputtering target	$714	Add to Chart
3"dia x 1/8"t Bismuth Ferrite sputtering target	P.O.R.	Add to Chart
2"dia x 1/8"t Bi3Fe5O12 sputtering target with In bonding to Cu bck plt	$794	Add to Chart
3"dia x 1/8"t Bi3Fe5O12 sputtering target with In bonding to Cu bck plt	P.O.R.	Add to Chart

About Our Sputtering Target

QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Mixed oxides sputter targets

Sputtering Bismuth Ferrite

Sputtering technique are frequently used to create a thin film of Bismuth Ferrite . The Bi3Fe5O12 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Bismuth Ferrite in this case, to create a thin film of Bi3Fe5O12 on the surface of the substrate.

Bismuth Ferrite Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

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