Boron Nitride (BN) Sputtering Targets
Composition: Boron Nitride (BN)
Catalog No.DPND5ST
Purity:99.5%Please click for discount and other size
- Product Details
Boron Nitride (BN) sputtering target specifications
Formula: BN
CAS No.: 10043-11-5
Max. dia. of flat disc sputter target:
Typical lead time of BN sputtering target: 4 weeks
Regular Dimensions and Price of Boron Nitride (BN) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Boron Nitride sputtering target |
$238 | Add to Chart |
3"dia
x 1/8"t Boron Nitride sputtering target |
$608 |
Add to Chart |
2"dia
x 1/8"t BN sputtering target with In bonding to Cu bck plt |
$318 |
Add to Chart |
3"dia
x 1/8"t BN sputtering target with In bonding to Cu bck plt |
$743 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Nitride sputter targets
Sputtering Boron Nitride
Sputtering technique are frequently used to create a thin film of Boron Nitride. The BN target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Boron Nitride in this case, to create a thin film of BN on the surface of the substrate.
Boron Nitride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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