Copper Aluminum Oxide (CuAlO2) Sputtering Targets

Copper Aluminum Oxide (CuAlO2) sputtering target specifications

Formula: CuAlO2

CAS No.: 12042-92-1

Max. dia. of flat sputter target: 6"

Typical lead time of CuAlO2 sputtering target: 5 weeks

Regular Dimensions and Price of Copper Aluminum Oxide (CuAlO2) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Copper Aluminum Oxide sputtering target	$990	Add to Chart
3"dia x 1/8"t Copper Aluminum Oxide sputtering target	$695	Add to Chart
2"dia x 1/8"t CuAlO2 sputtering target with In bonding to Cu bck plt	$1,070	Add to Chart
3"dia x 1/8"t CuAlO2 sputtering target with In bonding to Cu bck plt	$830	Add to Chart

About Our Sputtering Target

 QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product. 

Sputtering Copper Aluminum Oxide

Sputtering technique are frequently used to create a thin film of Copper Aluminum Oxide . The CuAlO2 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Copper Aluminum Oxide in this case, to create a thin film of CuAlO2 on the surface of the substrate.

Copper Aluminum Oxide Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

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