Copper Gallium (Cu/Ga) Sputtering Targets

Copper Gallium (Cu/Ga) sputtering target specifications

Formula: Cu/Ga

CAS No.: N.A.

Max. dia. of flat disc sputter target: 18"

Typical lead time of Cu/Ga sputtering target: 3 weeks

Regular Dimensions and Price of Copper Gallium (Cu/Ga) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Copper Gallium sputtering target	$674.5	Add to Chart
3"dia x 1/8"t Copper Gallium sputtering target	P.O.R.	Add to Chart
2"dia x 1/8"t Cu/Ga sputtering target with In bonding to Cu bck plt	$755	Add to Chart
3"dia x 1/8"t Cu/Ga sputtering target with In bonding to Cu bck plt	P.O.R.	Add to Chart

About Our Sputtering Target

QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Alloys sputter targets

Sputtering Copper Gallium

Sputtering technique are frequently used to create a thin film of Copper Gallium . The Cu/Ga target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Copper Gallium in this case, to create a thin film of Cu/Ga on the surface of the substrate.

Copper Gallium Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

Related Product

Bi1-xLaxFeO3 Sputter Target

YMnO3 Sputter Target

PbZr1-XTiXO3 Sputter Target