Nickel Oxide (NiO) Sputtering Targets
Composition: Nickel Oxide (NiO)
Catalog No.DPOX28ST
Purity:99.9%Please click for discount and other size
- Product Details
Nickel Oxide (NiO) sputtering target specifications
Formula: NiO
CAS No.:1313-99-1
Max. dia. of flat disc sputter target: 18"
Typical lead time of NiO sputtering target: 4 weeks
Regular Dimensions and Price of Nickel Oxide (NiO) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Nickel Oxide sputtering target |
$396 | Add to Chart |
3"dia
x 1/8"t Nickel Oxide sputtering target |
$521 |
Add to Chart |
2"dia
x 1/8"t NiO sputtering target with In bonding to Cu bck plt |
$476 |
Add to Chart |
3"dia
x 1/8"t NiO sputtering target with In bonding to Cu bck plt |
$656 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
Sputtering Nickel Oxide
Sputtering technique are frequently used to create a thin film of Nickel Oxide . The NiO target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Nickel Oxide in this case, to create a thin film of NiO on the surface of the substrate.
Nickel Oxide Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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