Oxide Ceramic Sputter Target
In the realm of sputtering target materials, oxides have emerged as a versatile and indispensable category, enabling the deposition of a wide range of thin films with diverse applications. These oxide-based targets, composed of compounds.
One of the primary advantages of oxide sputtering targets lies in their ability to produce transparent conductive thin films, which are crucial for applications in display technologies, solar cells, and optoelectronic devices. The unique optical and electrical properties of materials like ITO and fluorine-doped tin oxide (FTO) make them ideal for the development of transparent electrodes, enabling the creation of energy-efficient and high-performance displays, as well as advanced photovoltaic systems.
Beyond their use in transparent conductive coatings, oxide sputtering targets also play a pivotal role in the deposition of dielectric and insulating thin films. These materials, which include silicon oxide (SiO2), aluminum oxide (Al2O3), and hafnium oxide (HfO2), are essential for the fabrication of gate dielectrics, passivation layers, and optical coatings in microelectronic devices, ensuring reliable operation and enhanced performance.
As a supplier of custom composition sputtering targets, QS Advanced Materials could process a wide range of materials, including the regular oxide ceramics and not usually thin special mixed oxides. We are willing to try on small trial compositions. Some examples of popular oxide sputter targets are neodymium oxide (Nd2O3), Alumina Zinc Oxide (AZO), Indium Tin Oxide (ITO) and mixed oxide sputtering targets such as Lanthanum Nickel Oxide (LaNiO3) and YIG sputter target.-
Terbium Oxide (Tb4O7) Sputtering Targets
Composition: Terbium Oxide (Tb4O7)
Catalog No.DPOX65ST
Purity:99.9% ~ 99.99% (REO)Please click for discount and other size
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Thulium Oxide (Tm2O3) Sputtering Targets
Composition: Thulium Oxide (Tm2O3)
Catalog No.DPOX69ST
Purity:99.9% ~ 99.99% (REO)Please click for discount and other size
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Yttrium Oxide (Y2O3) Sputtering Targets
Composition: Yttrium Oxide (Y2O3)
Catalog No.DPOX39ST
Purity:99.9% ~ 99.99% (REO)Please click for discount and other size
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Ytterbium Oxide (Yb2O3) Sputtering Targets
Composition: Ytterbium Oxide (Yb2O3)
Catalog No.DPOX70ST
Purity:99.9% ~ 99.99% (REO)Please click for discount and other size
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Titanium Dioxide (TiO2) Sputtering Targets
Composition: Titanium Dioxide (TiO2)
Catalog No.:DPOX22ST
Purity:99.9% ~ 99.99%
Maximum Diameter:18"
Typical Lead Time:3 weeks -
Vanadium Dioxide (VO2) Sputtering Target
Composition:Vanadium(IV) Dioxide (VO2)
Catalog No.:DPOX23ST2
Purity:99.99%
Maximum Diameter:10"
Typical Lead Time:4 weeks
Ref. Price:$565 (2" Dia. x 1/8") -
Neodymium Oxide (Nd2O3) Sputtering Targets
Composition:Neodymium Oxide (Nd2O3)
Catalog No.:DPOX60ST
Purity:99.9% ~ 99.99% (REO)
Maximum Diameter:18"
Typical Lead Time:3 weeks
Ref. Price:$500 (2" Dia. x 1/8") -
Scandium Oxide (Sc2O3) Sputter Target
Composition: Scandium Oxide(Sc2O3)
Catalog No.DPO21ST
Purity:99.9% (REO)Please click for discount and other size
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Lanthanum Titanate (LaTiO3) Sputtering Targets
Composition: Lanthanum Titanate (LaTiO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
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Lead Zirconate (PbZrO3) Sputtering Targets
Composition: Lead Zirconate (PbZrO3)
Catalog No.DPOX82ST
Purity:99.9%Please click for discount and other size
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Strontium Ruthenate (SrRuO3) Sputtering Targets
Composition: Strontium Ruthenate (SrRuO3)
Catalog No.DPOX38ST
Purity:99.9%Please click for discount and other size
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Strontium Titanate (SrTiO3) Sputtering Targets
Composition: Strontium Titanate (SrTiO3)
Catalog No.DPOX38ST
Purity:99.9%Please click for discount and other size