Scandium Oxide (Sc2O3) Sputter Target

About oxide sputter targets

Metal oxide refers to a binary compound composed of oxygen and another metal chemical element. It can usually be made into solid ceramic materials by hot pressing, and then processed into sputter targets and other scientific research costs. Under normal circumstances, thin films made of metal oxides have special properties in optical and electrical aspects.

Scandium Oxide (Sc2O3) sputtering target specifications

Formula: Sc2O3

CAS No.: 12060-08-1

Max. dia. of flat sputter target: 18"

Typical lead time of Sc2O3 sputtering target: 5weeks

Regular Dimensions and Price of Scandium Oxide (Sc2O3) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Scandium Oxide sputtering target	$912	Add to Chart
3"dia x 1/8"t Scandium Oxide sputtering target	$2000	Add to Chart
2"dia x 1/8"t Sc2O3 sputtering target with In bonding to Cu bck plt	$992	Add to Chart
3"dia x 1/8"t Sc2O3 sputtering target with In bonding to Cu bck plt	$2,135	Add to Chart

About Our Sputtering Target

 QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product. 

Sputtering Scandium Oxide

Sputtering technique are frequently used to create a thin film of Scandium Oxide. The Sc2O3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Scandium Oxide in this case, to create a thin film of Sc2O3 on the surface of the substrate.

Scandium Oxide Sputtering Target Packaging

QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

Related Product

BaZr0.2Ti0.8O3 Sputter Target

SrInO3 Sputter Target

HoMnO3 Sputter Target