Barium Titanate (BaTiO3) Sputtering Targets

Barium Titanate (BaTiO3) sputtering target specifications

Formula: BaTiO3

CAS No.: 12047-27-7

Max. dia. of flat sputter target: 6"

Typical lead time of BaTiO3 sputtering target: 5 weeks

Regular Dimensions and Price of Barium Titanate (BaTiO3) Sputtering Target

Product Name	Reference Price
2"dia x 1/8"t Barium Titanate sputtering target	$595	Add to Chart
3"dia x 1/8"t Barium Titanate sputtering target	$608	Add to Chart
2"dia x 1/8"t BaTiO3 sputtering target with In bonding to Cu bck plt	$675	Add to Chart
3"dia x 1/8"t BaTiO3 sputtering target with In bonding to Cu bck plt	$743	Add to Chart

About Our Sputtering Target

 QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our sputter target material and other customized product. 

Sputtering Barium Titanate

Sputtering technique are frequently used to create a thin film of Barium Titanate . The BaTiO3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Barium Titanate in this case, to create a thin film of BaTiO3 on the surface of the substrate.

Barium Titanate Sputtering Target Packaging

QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA

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