Bismuth Telluride (Bi2Te3) Sputtering Targets
Composition: Bismuth Telluride (Bi2Te3)
Catalog No.DPTE83ST
Purity:99.9% ~ 99.999%Please click for discount and other size
- Product Details
Bismuth Telluride (Bi2Te3) sputtering target specifications
Formula: Bi2Te3
CAS No.: 1304-82-1
Max. dia. of flat disc sputter target: 10"
Typical lead time of Bi2Te3 sputtering target: 4 weeks
Regular Dimensions and Price of Bismuth Telluride (Bi2Te3) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Bismuth Telluride sputtering target |
$1,031 | Add to Chart |
3"dia
x 1/8"t Bismuth Telluride sputtering target |
$1,173 |
Add to Chart |
2"dia
x 1/8"t Bi2Te3 sputtering target with In bonding to Cu bck plt |
$1,111 |
Add to Chart |
3"dia
x 1/8"t Bi2Te3 sputtering target with In bonding to Cu bck plt |
$1,308 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Tellurides sputter targets
Sputtering Bismuth Telluride
Sputtering technique are frequently used to create a thin film of Bismuth Telluride . The Bi2Te3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Bismuth Telluride in this case, to create a thin film of Bi2Te3 on the surface of the substrate.
Bismuth Telluride Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA




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