Copper Oxide (CuO) Sputtering Targets
Composition: Copper Monoxide (CuO)
Catalog No.DPOX29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
- Product Details
Copper Monoxide (CuO) sputtering target specifications
Formula: CuO
CAS No.:1344-70-3
Max. dia. of flat disc sputter target: 18"
Typical lead time of CuO sputtering target: 4 weeks
Regular Dimensions and Price of Copper Monoxide (CuO) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Copper Monoxide sputtering target |
$753 | Add to Chart |
3"dia
x 1/8"t Copper Monoxide sputtering target |
$652 |
Add to Chart |
2"dia
x 1/8"t CuO sputtering target with In bonding to Cu bck plt |
$833 |
Add to Chart |
3"dia
x 1/8"t CuO sputtering target with In bonding to Cu bck plt |
$787 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
Sputtering Copper Monoxide
Sputtering technique are frequently used to create a thin film of Copper Monoxide . The CuO target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Copper Monoxide in this case, to create a thin film of CuO on the surface of the substrate.
Copper Monoxide Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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