Indium Oxide (In2O3) Sputtering Targets
Composition: Indium Oxide (In2O3)
Catalog No.DPOX49ST
Purity:99.9% ~ 99.99%Please click 
for discount and other size
- Product Details
Indium Oxide (In2O3) sputtering target specifications
Formula: In2O3
CAS No.:1312-43-2
Max. dia. of flat disc sputter target: 18"
Typical lead time of In2O3 sputtering target: 3 weeks
Regular Dimensions and Price of Indium Oxide (In2O3) Sputtering Target
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Product Name |
Reference Price |
|
|
2"dia
x 1/8"t Indium Oxide sputtering target |
$674 | Add to Chart |
|
3"dia
x 1/8"t Indium Oxide sputtering target |
$869 |
Add to Chart |
|
2"dia
x 1/8"t In2O3 sputtering target with In bonding to Cu bck plt |
$754 |
Add to Chart |
|
3"dia
x 1/8"t In2O3 sputtering target with In bonding to Cu bck plt |
$1,004 | Add to Chart |
About Our Sputtering Target
QS Advanced Materials Inc is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Oxides sputter targets
Sputtering Indium Oxide
Sputtering technique are frequently used to create a thin film of Indium Oxide . The In2O3 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Indium Oxide in this case, to create a thin film of In2O3 on the surface of the substrate.
Indium Oxide Sputtering Target Packaging
QS Advanced Materials Incs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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