Nickel Boride (NiB)Sputtering Targets
Composition: Nickel Boride (NiB)
Catalog No.DPBO28ST
Purity:99.5%
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Click here for the specifications of Ni2B sputter target
Click here for the SDS document of Ni2B Sputter Target
- Product Details
Nickel Boride (Ni2B) sputtering target specifications
Formula: Ni2B
CAS No.: 12007-01-1
Max. dia. of flat disc sputter target: 8"
Typical lead time of Ni2B sputtering target: 4 weeks
Regular Dimensions and Price of Nickel Boride (Ni2B) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Nickel Boride sputtering target |
$714 | Add to Chart |
3"dia
x 1/8"t Nickel Boride sputtering target |
$869 |
Add to Chart |
2"dia
x 1/8"t Ni2B sputtering target with In bonding to Cu bck plt |
$794 |
Add to Chart |
3"dia
x 1/8"t Ni2B sputtering target with In bonding to Cu bck plt |
$1,004 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Borides sputter targets
Sputtering Nickel Boride
Sputtering technique are frequently used to create a thin film of Nickel Boride. The Ni2B target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Nickel Boride in this case, to create a thin film of Ni2B on the surface of the substrate.
Nickel Boride Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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