Silicon Nitride (Si3N4) Sputtering Targets
Composition: Silicon Nitride (Si3N4)
Catalog No.DPND14ST
Purity:99.5% ~ 99.9%Please click for discount and other size
- Product Details
Silicon Nitride (Si3N4) sputtering target specifications
Formula: Si3N4
CAS No.: 12033-89-5
Max. dia. of flat disc sputter target:
Typical lead time of Si3N4 sputtering target: 4 weeks
Regular Dimensions and Price of Silicon Nitride (Si3N4) Sputtering Target
Product Name |
Reference Price |
|
2"dia
x 1/8"t Silicon Nitride sputtering target |
$426 | Add to Chart |
3"dia
x 1/8"t Silicon Nitride sputtering target |
$521 |
Add to Chart |
2"dia
x 1/8"t Si3N4 sputtering target with In bonding to Cu bck plt |
$506 |
Add to Chart |
3"dia
x 1/8"t Si3N4 sputtering target with In bonding to Cu bck plt |
$656 | Add to Chart |
About Our Sputtering Target
QSAM is a professional supplier of custom manufacturered R&D consumptions. Our equipment setup are flexible to meet various demands from wide range of customers for flat disc sputter targets. We are supporting US national labs and worldwide univeristies and researching facilities with our target material and other customized product. Please check here for the list of our other Nitride sputter targets
Sputtering Silicon Nitride
Sputtering technique are frequently used to create a thin film of Silicon Nitride. The Si3N4 target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Silicon Nitride in this case, to create a thin film of Si3N4 on the surface of the substrate.
Silicon Nitride Sputtering Target Packaging
QSAMs sputter targets are vacuum sealed in plastic bags for shipping. We also use heavy foam to protect it. Common documents together with the sputter targets are packing list and analytical report e.g. COA
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