High Purity Materials
QS Advnaced Materials use a lot high purity materials to make our products. Some of these materials are also suitable as a product themselves. These includes zirconium and hafnium crystal bar, Electrolyte Iron (Fe), Distilled rare earth metal, and semicon grade boron, etc.
Crystal Bars
Zirconium and hafnium are two closely related elements that share similar properties and crystal structures. Both elements belong to the same group in the periodic table, known as the "titanium group". A crystal bar of Zirconium or Hafnium refers to a high-purity Zr or Hf metal produced using the iodide crystallization method. In the manufacturing process, the raw materials of Zr or Hf are chemically reacted to form zirconium iodide or hafnium iodide. Due to the relatively low boiling point of iodides, they can be evaporated in a vacuum environment without too much heat. Subsequently, the iodides are heated to high temperatures in a reaction vessel and then decompose and depositing onto a master wire due to the higher temperature of master wire. For Zirconium crystal bars, a Zr wire is used as the master wire, while for Hafnium crystal bars, an Hf wire is used. This crystallization method yields polycrystalline metallic rods, hence the name "crystal bar." The evaporative recrystallization process significantly improves the purity of the metal, typically achieving levels of 99.95% or even higher.
Semicon Grade Boron
As a lightweight element, boron is not inherently expensive. However, in order to meet the requirements of the semiconductor industry, high-purity boron with a purity level exceeding 99.99% is necessary. QSAM, in collaboration with its partners, has obtained a supply of high-purity boron to cater to the needs of research institutions, addressing the demand for large-scale experiments. Additionally, QSAM can provide assistance for large-scale production, ensuring a reliable source of high-purity boron.
Distilled Rare Earth Metal
Rare earth metal distillation purification is a process used to separate and purify rare earth metals. It involves heating the mixed rare earth metals to their respective boiling points and then condensing and collecting the vaporized metals. Tantalum condensers are commonly used due to their excellent resistance to corrosion and high melting point. They efficiently cool and condense the vaporized rare earth metals, allowing for their collection. Tungsten crucibles are utilized to contain the rare earth metal raw material during distillation. This distillation process enables the production of high-purity rare earth metals for various industrial applications.
Related Articles
-
Bismuth Ferrite (Garnet, Bi3Fe5O12) Sputtering Targets
Composition: Bismuth Ferrite (Bi3Fe5O12)
Catalog No.DPOX83ST
Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of Bi3Fe5O12 sputter target
-
Bismuth Titanate (Bi4Ti3O12) Sputtering Targets
Composition: Bismuth Titanate (Bi4Ti3O12)
Catalog No.DPOX83ST
Purity:99.9%Please click for discount and other size
Click here for the specifications of Bi4Ti3O12 sputter target
-
Copper Aluminum Oxide (CuAlO2) Sputtering Targets
Composition: Copper Aluminum Oxide (CuAlO2)
Catalog No.DPOX29ST
Purity:99.9% ~ 99.99%Please click for discount and other size
-
Lanthanum Aluminate (LaAlO3) Sputtering Targets
Composition: Lanthanum Aluminate (LaAlO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
-
Lanthanum Manganate (LaMnO3) Sputtering Targets
Composition: Lanthanum Manganate (LaMnO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
-
Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
Composition: Lanthanum Nickel Oxide (LaNiO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
-
Lanthanum Niobium Oxide (LaNbO3) Sputtering Targets
Composition: Lanthanum Niobium Oxide (LaNbO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
-
IGZO (Indium Gallium Zinc Oxide) Sputtering Targets
Composition: IGZO (Indium Gallium Zinc Oxide)
Catalog No.DPOX49ST
Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of Indium Gallium Zinc Oxide sputter target
Click here for the SDS document of Indium Gallium Zinc Oxide Sputter Target
-
Lanthanum Vanadium Oxide (LaVO3) Sputtering Targets
Composition: Lanthanum Vanadium Oxide (LaVO3)
Catalog No.DPOX57ST
Purity:99.9%Please click for discount and other size
-
Lead Titanate (PbTiO3) Sputtering Targets
Composition: Lead Titanate (PbTiO3)
Catalog No.DPOX82ST
Purity:99.9%Please click for discount and other size
-
Lead Zirconium Titanate (PbZr0.52Ti0.48O3) Sputtering Targets
Composition: Lead Zirconium Titanate (PbZr0.52Ti0.48O3)
Catalog No.DPOX82ST
Purity:99.9%Please click for discount and other size
Click here for the specifications of PbZr0.52Ti0.48O3 sputter target
Click here for the SDS document of PbZr0.52Ti0.48O3 Sputter Target
-
Lithium Cobalt Oxide (LiCoO2) Sputtering Targets
Composition: Lithium Cobalt Oxide (LiCoO2)
Catalog No.DPOX3ST
Purity:99.9%Please click for discount and other size
-
Lithium Niobate (LiNbO3) Sputtering Targets
Composition: Lithium Niobate (LiNbO3)
Catalog No.DPOX3ST
Purity:99.9%Please click for discount and other size
-
Lithium Phosphate (Li3PO4) Sputtering Targets
Composition: Lithium Phosphate (Li3PO4)
Catalog No.DPOX3ST
Purity:99.9% ~ 99.95%Please click for discount and other size
-
Strontium Zirconate (SrZrO3) Sputtering Targets
Composition: Strontium Zirconate (SrZrO3)
Catalog No.DPOX38ST
Purity:99.9%Please click for discount and other size
-
Aluminum Oxide (Al2O3) Sputtering Targets
Composition: Aluminum Oxide (Al2O3)
Catalog No.DPOX13ST
Purity:99.9% ~ 99.995%Please click for discount and other size
-
Antimony Oxide (Sb2O3) Sputtering Targets
Composition: Antimony Oxide (Sb2O3)
Catalog No.DPOX51ST
Purity:99.9%Please click for discount and other size
-
AZO (ZnO/Al2O3) Sputtering Targets
Composition: AZO (ZnO/Al2O3)
Catalog No.DPOX30ST
Purity:99.9% ~ 99.99%Please click for discount and other size
Click here for the specifications of ZnO/Al2O3 sputter target
-
Bismuth Oxide (Bi2O3) Sputtering Targets
Composition: Bismuth Oxide (Bi2O3)
Catalog No.DPOX83ST
Purity:99.9% ~ 99.99%Please click for discount and other size
-
Chromium Doped Silicon Monoxide (Cr-SiO) Sputtering Targets
Composition: Silicon Monoxide (Cr-SiO)
Catalog No.DPOX24ST
Purity:99.9% ~ 99.99%Please click for discount and other size